A Review: Breakdown Voltage Enhancement of GaN Semiconductors Based High Electron Mobility Transistors
dc.contributor.author | Çiçek, Osman | |
dc.contributor.author | Badali, Yosef | |
dc.date.accessioned | 2024-04-01T11:55:24Z | |
dc.date.available | 2024-04-01T11:55:24Z | |
dc.date.issued | 2024 | en_US |
dc.department | Fakülteler, Mühendislik Fakültesi, Bilgisayar Mühendisliği Bölümü | en_US |
dc.description.abstract | Gallium Nitride (GaN) based High Electron Mobility Transistors (HEMTs) are regarded as fundamental semiconductor devices for future power electronic applications. Consequently, researchers have directed their efforts toward enhancing critical parameters such as the breakdown voltage (Vbr), cut-off frequency, and operating temperature. Therefore, this review article explores research endeavors concerning the enhancement of Vbr in GaN-based HEMTs. The objective is to gain insights into the key factors influencing Vbr values and to identify the constraints that govern the optimal performance of HEMTs in power devices. Additionally, this review provides an in-depth examination of select studies that introduce novel techniques for improving Vbr values. | en_US |
dc.identifier.doi | 10.1109/TDMR.2024.3379745 | en_US |
dc.identifier.scopus | 2-s2.0-85188669790 | en_US |
dc.identifier.scopusquality | N/A | en_US |
dc.identifier.uri | https://hdl.handle.net/11467/7218 | |
dc.identifier.uri | https://doi.org/10.1109/TDMR.2024.3379745 | |
dc.identifier.wos | WOS:001253145400015 | en_US |
dc.identifier.wosquality | N/A | en_US |
dc.indekslendigikaynak | Web of Science | en_US |
dc.indekslendigikaynak | Scopus | en_US |
dc.language.iso | en | en_US |
dc.publisher | Institute of Electrical and Electronics Engineers Inc. | en_US |
dc.relation.ispartof | IEEE Transactions on Device and Materials Reliability | en_US |
dc.relation.publicationcategory | Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı | en_US |
dc.rights | info:eu-repo/semantics/embargoedAccess | en_US |
dc.subject | GaN, HEMTs, Wide-bandgap, Negative-Bias Temperature Instability, Field-Plated Structure, Passivation Layer, Breakdown Voltage Enhancement | en_US |
dc.title | A Review: Breakdown Voltage Enhancement of GaN Semiconductors Based High Electron Mobility Transistors | en_US |
dc.type | Article | en_US |
Dosyalar
Orijinal paket
1 - 1 / 1
Küçük Resim Yok
- İsim:
- A_Review_Breakdown_Voltage_Enhancement_of_GaN_Semiconductors_Based_High_Electron_Mobility_Transistors.pdf
- Boyut:
- 1.16 MB
- Biçim:
- Adobe Portable Document Format
- Açıklama:
Lisans paketi
1 - 1 / 1
Küçük Resim Yok
- İsim:
- license.txt
- Boyut:
- 1.56 KB
- Biçim:
- Item-specific license agreed upon to submission
- Açıklama: